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High Power Impulse Magnetron Sputtering (HIPIMS) has been developed on rotating PVD magnetron sources for uniform deposition on 200mm single wafer tools for barrier and seed layer deposition in through silicon vias (TSV)

This 'Innovatial' project focuses on the development of protective coatings for a new generation of lightweight titanium gamma aluminide materials that are in high demand in modern aircraft and cars

Ti-Al-Si-N and Cr-Al-Si-N are high-temperature resistant coatings for cutting tool applications, created in collaboration with University of Freiberg, Germany

From 1999-2002, the Raman Spectroscopy of PVD Coatings project aimed to develop a Raman based method of monitoring the quality of coatings produced by the Surface Engineering Group and monitor stress and wear induced changes in hard coatings

We offer a complete coating development package giving a choice of composition, architecture (monolayer or multilayers) and PVD deposition techniques to suit specific needs

Arc discharges are used for pretreatment of substrates prior to coating deposition

Licensed process for the upscaling and implementation of High Power Impulse Magnetron Sputtering technology for the deposition of hard coatings

Adapt and expand the capability of existing of plasma diagnostic techniques to the environment of the HIPIMS discharge

The surface of metallic substrate is engineered by plasma cleaning to remove contamination and metal ion implantation to enhance wetting of the subsequent coating layer

We have comprehensive expertise in HIPIMS pretreatment and coating technology. Our deposition systems are available for pilot industrial scale production, process development, test of concept and fundamental research.