Understanding the fundamentals of HIPIMS plasma

As part of an ongoing programme of fundamental studies, the plasma produced during the coating cycle is being studied in an attempt to link plasma properties to physical film properties

High Power Impulse Magnetron Sputtering (HIPIMS) has been developed on rotating PVD magnetron sources for uniform deposition on 200mm single wafer tools for barrier and seed layer deposition in through silicon vias (TSV)

To meet continuous demands for improved performance of the state of art hard coatings for tribological applications it is necessary to incorporate novel plasma assisted deposition technology into the present coating equipment providing better control over the energy of film forming species

The project involved the development of a nitriding process to work at low pressures, achieving high plasma densities and degree of activation of nitrogen

Licensed process for the upscaling and implementation of High Power Impulse Magnetron Sputtering technology for the deposition of hard coatings

A training school on HIPIMS was organised by Professor Arutiun Ehiasarian to address the need for High Power Impulse Magnetron Sputtering (HIPIMS) fundamentals and research findings to reach a wider audience

Adapt and expand the capability of existing of plasma diagnostic techniques to the environment of the HIPIMS discharge

We tailor HIPIMS-based treatment processes to suit applications on today's market