Arutiun is one of the pioneers of high power impulse magnetron sputtering (HIPIMS) technology.

Yashodhan joined the Nanotechnology Centre for PVD Research in October 2006 as a postdoctoral researcher

Understanding the fundamentals of HIPIMS plasma

As part of an ongoing programme of fundamental studies, the plasma produced during the coating cycle is being studied in an attempt to link plasma properties to physical film properties

To meet continuous demands for improved performance of the state of art hard coatings for tribological applications it is necessary to incorporate novel plasma assisted deposition technology into the present coating equipment providing better control over the energy of film forming species

This 'Innovatial' project focuses on the development of protective coatings for a new generation of lightweight titanium gamma aluminide materials that are in high demand in modern aircraft and cars

High Power Impulse Magnetron Sputtering (HIPIMS) has been developed on rotating PVD magnetron sources for uniform deposition on 200mm single wafer tools for barrier and seed layer deposition in through silicon vias (TSV)

Licensed process for the upscaling and implementation of High Power Impulse Magnetron Sputtering technology for the deposition of hard coatings

Ti-Al-Si-N and Cr-Al-Si-N are high-temperature resistant coatings for cutting tool applications, created in collaboration with University of Freiberg, Germany

From 1999-2002, the Raman Spectroscopy of PVD Coatings project aimed to develop a Raman based method of monitoring the quality of coatings produced by the Surface Engineering Group and monitor stress and wear induced changes in hard coatings